Foreign-catalyst-free growth of InAs/InSb axial heterostructure nanowires on Si (111) by molecular-beam epitaxy

Epitaxial high-quality InAs/InSb axial heterostructure nanowires are of great interest due to their distinct advantages in fundamental research as well as applications in semiconductor electronic and quantum devices. Currently, nearly all the growth of InAs/InSb axial heterostructure nanowires is assisted with foreign catalysts such as Au, and work on foreign-catalyst-free growth of InAs/InSb axial heterostructure nanowires is lacking. Here we report on the growth of InAs/InSb axial heterostructure nanowires on Si (111) substrates by molecular-beam epitaxy without using any foreign catalysts. The Sb/In beam equivalent pressure (BEP) ratio is found to have important influence on the heterostructure nanowire morphology, and InSb nanowires can be epitaxially grown on InAs nanowire stems with a hexagonal prism and nanosheet-like shapes when the Sb/In BEP ratio varies from 10 to 20. Transmission electron microscopy studies reveal that the InAs nanowire stems have a mixture of zincblende (ZB) and wurtzite (WZ) crystal structures, while InSb nanowire parts have a pure ZB crystal structure free of stacking faults. Composition analysis of axial heterostructure nanowires provides clear evidence that the InSb nanowires are epitaxially grown on InAs nanowires in an In self-assisted vapor–liquid–solid manner. This study paves a new route for growing narrow-gap semiconductor heterostructures with strong spin–orbit interaction for the study of topological states, and the growth manner presented here is expected to be used to grow other In-based axial heterostructure nanowires.

Source:IOPscience

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InAs/InSb nanowire heterostructures grown by chemical beam epitaxy

We report the Au-assisted chemical beam epitaxy growth of defect-free zincblende InSb nanowires. The grown InSb segments are the upper sections of InAs/InSb heterostructures on InAs(111)B substrates. We show, through HRTEM analysis, that zincblende InSb can be grown without any crystal defects such as stacking faults or twinning planes. Strain-map analysis demonstrates that the InSb segment is nearly relaxed within a few nanometers from the interface. By post-growth studies we have found that the catalyst particle composition is AuIn2, and it can be varied to a AuIn alloy by cooling down the samples under TDMASb flux.

Source:IOPscience

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High Resistivity InSb Crystal Growth using the Vertical Bridgman Method for Fabrication of Schottky Diodes

Compound semiconductor InSb crystals were grown using raw materials with different purities, for application as radiation detector substrates. The electrical properties of the grown crystals were compared with those of commercial InSb wafers. The resistivity of the grown crystals prepared from 99.9999% purity raw materials showed a higher value than those of commercial crystals.

Source:IOPscience

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THz Wave Modulator Based on the Decay of THz Surface Plasmon along an Intrinsic InSb Surface

THz surface plasmon are decayed exponentially when propagating along the surface of a semiconductor. A metal razor bladeis used to couple THz surface plasmon to THz waves at different position on the surface of an indium antimonide wafer. Thus the intensity of the output THz wave is modulated.

Source:IOPscience

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